5026 series
5026BL1 (2.5V operation)
= 2.25 to 2.75V, V = 0V, Ta = −40 to +85°C unless otherwise noted.
V
DD
SS
Rating
Parameter
Symbol
Condition
Unit
min
1.65
–
typ
1.95
0.3
–
max
–
HIGH-level output voltage
LOW-level output voltage
HIGH-level input voltage
LOW-level input voltage
V
Q: Measurement cct 1, V = 2.25V, I = 8mA
DD OH
V
V
OH
V
Q: Measurement cct 2, V = 2.25V, I = 8mA
DD OL
0.4
–
OL
V
INHN
INHN
0.7V
V
IH
DD
V
–
–
–
–
0.3V
V
IL
DD
V
V
= V
= V
–
10
10
ꢀA
ꢀA
OH
DD
Output leakage current
I
Q: Measurement cct 2, INHN = LOW
Z
–
OL
SS
Measurement cct 3, load cct 1, INHN = open, C = 30pF,
L
f = 100MHz
Current consumption
Standby current
I
–
14
28
mA
DD2
I
Measurement cct 3, INHN = LOW
–
2
–
6
3
ꢀA
MΩ
kΩ
kΩ
ST
R
12
UP1
INHN pull-up resistance
Feedback resistance
Measurement cct 4
R
20
50
100
–
200
150
UP2
R
Measurement cct 5
f
Oscillator amplifier output
resistance
R
Design value. A monitor pattern on a wafer is tested.
170
200
230
Ω
D
C
6.8
8.5
8
9.2
pF
pF
G
Built-in capacitance
Design value. A monitor pattern on a wafer is tested.
C
10
11.5
D
5026BL1 (3.0V operation)
= 2.7 to 3.6V, V = 0V, Ta = −40 to +85°C unless otherwise noted.
V
DD
SS
Rating
Parameter
Symbol
Condition
Unit
min
2.3
typ
2.4
0.3
–
max
–
HIGH-level output voltage
LOW-level output voltage
HIGH-level input voltage
LOW-level input voltage
V
Q: Measurement cct 1, V = 2.7V, I = 8mA
DD OH
V
V
OH
V
Q: Measurement cct 2, V = 2.7V, I = 8mA
DD OL
–
0.4
–
OL
V
INHN
INHN
0.7V
V
IH
DD
V
–
–
–
–
0.3V
V
IL
DD
V
V
= V
= V
–
10
10
ꢀA
ꢀA
OH
DD
Output leakage current
I
Q: Measurement cct 2, INHN = LOW
Z
–
OL
SS
Measurement cct 3, load cct 1, INHN = open, C = 30pF,
L
f = 100MHz
Current consumption
Standby current
I
–
19
38
mA
DD2
I
Measurement cct 3, INHN = LOW
–
2
–
4
5
ꢀA
MΩ
kΩ
kΩ
ST
R
8
UP1
INHN pull-up resistance
Feedback resistance
Measurement cct 4
R
15
50
75
–
150
150
UP2
R
Measurement cct 5
f
Oscillator amplifier output
resistance
R
Design value. A monitor pattern on a wafer is tested.
170
200
230
Ω
D
C
6.8
8.5
8
9.2
pF
pF
G
Built-in capacitance
Design value. A monitor pattern on a wafer is tested.
C
10
11.5
D
SEIKO NPC CORPORATION —7