65nm CMOS Standard Cell
CS200 ASIC Series
Large
Leakage Current
Low Power
Low Power
Lineup
Lineup
CS200LL
CS200A
HS-Tr
Server/
Network
UHS-Tr
UHS-Tr
HV-Tr
D-
HV-Tr
Mo
C
Mobile
HS-Tr
HS-Tr
D-
k
D-
STD-Tr
STD-Tr
High End Server
STD-Tr
STD-Tr
LL-Tr
Cellular Phone
Digital Consumer
Computing
HighHigh
Performance
Performance
Lineup CS200HP
Lineup CS200
UHS: Ultra High Speed, HS: High Speed
STD: Standard, LL: Low Leakage
Speed
Fast
▼
Features
• High integration
– Transistor of 30–50nm gate length (ITRS road map 65nm)
– 12-layer fine pitch, copper wiring, and low-K insulating
material techniques
– Maximum 180 million gates, nearly twice that of 90nm
technology
– 50% reduction in SRAM cell size
– 30% increase in performance over 90nm
• Low power consumption/low leakage current
• I/O with pad structure with fine pad pitch technology for chip
size reduction
• High-speed library and low-power library available
– High speed: CS200HP
– Low leak: CS200L
• Higher performance, gate propagation delay tpd = 4.4ps
(@1.2V, inverter, and F/O = 1, CS200HP)
• Compiled memory macros: 1T and 6T SRAMs, and ROM
• Application specific IPs
– Computational cores: ARM7, 9, 11, Communication and
Digital-AV DSP
– Mixed signals: Wide range of ADCs and DACs
– HSIF logics: PCI-Express, XAUI, SATA, DDR, USB, HDMI
• High-speed interface SerDes macros (~10Gbps data rate)
• Wide range of PLLs: standard to high-speed 1.6GHz
• Standard I/Os: LVTTL, SSTL, HSTL, LVDS, P-CML
• Wide supply voltage (0.80V to 1.30V for core)
• Triple Vth Transistor options
• Various packages available (QFP, FBGA, EBGA, PBGA,
FC-BGA)
• Design methodology and support
– Methodology in place to support multi-million-gates
hierarchical designs
– Excellent design center support at Sunnyvale and Dallas
– Worldwide service organizations for global support
Description
CS200 Series, 65nm standard cells CMOS process technology,
addresses the design challenges of the PDA and mobile computing
market in low power and multi-functionality. It also addresses
the need of ultra high performance design in leading-edge
networking, server computing, and in complex telecom
equipment applications. 65nm technology is available in 300mm
fabrication and supports high volume wafer capacity in multiple
manufacturing locations.
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FUJITSU [ FUJITSU COMPONENT LIMITED. ]
