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5962-0422103QXC 参数 Datasheet PDF下载

5962-0422103QXC图片预览
型号: 5962-0422103QXC
PDF下载: 下载PDF文件 查看货源
内容描述: [Field Programmable Gate Array, 2000000 Gates, 32256-Cell, CMOS, CQFP352, CERAMIC, QFP-352]
分类和应用: 可编程逻辑
文件页数/大小: 217 页 / 1554 K
品牌: ACTEL [ Actel Corporation ]
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MIL-PRF-38535K  
APPENDIX A  
TABLE A-IV. Package element (other than leads/terminals) finish systems.  
Finish  
Applied over  
Gold plate  
Required underplate  
Electroplated  
nickel 1/  
Electroless  
nickel 1/  
Nickel cladding  
1/  
None  
X
Hot solder dip  
Hot solder dip  
Hot solder dip  
Hot solder dip  
Hot solder dip  
Hot solder dip  
Hot solder dip  
X
X
X
X
X
X
X
X
X
Tin-lead plate 2/  
Tin-lead plate 2/  
Tin-lead plate 2/  
Tin-lead plate 2/  
X
X
X
X
X
X
X
Gold plate 3/  
Gold plate 3/  
Gold plate 3/  
Electroplated nickel 1/  
Electroless nickel 1/  
Nickel cladding 1/  
X
X
X
Palladium  
X
X
Gold flash palladium  
1/ Combinations of electroplated nickel and electroless nickel and nickel cladding are permitted.  
2/ Fusing of tin-lead plate is permitted in accordance with A.3.5.6.3.5.  
3/ Multilayer gold and nickel finish structures are acceptable provided the outer gold layer meets a minimum  
thickness of 25 microinches (0.635 micrometer), the total of the gold layers meet a minimum thickness of 50  
microinches (1.27 micrometers), and each of the nickel undercoats meet the thickness requirements of table  
A-III with the total nickel thickness not to exceed 450 microinches (11.43 micrometers). For multilayer finish  
structures, nickel plate, nickel cladding, or gold plate are permitted on the base metal.  
A.3.5.8 Glassivation. All microcircuits shall be coated with a transparent glass or other approved coating, except  
where glassivation is omitted by documented design rules (e.g., probe opening, fuse pads, etc.) The minimum  
glassivation thickness shall be 6,000 Å (600 nm) for Si02, 2,000 Å (200 nm) for Si3N4, or approved thicknesses for  
approved coatings. The composition and minimum thickness of other approved coatings are subject to approval by  
the QA, and must be included in the manufacturer’s QM plan. The glassivation/nitridation shall cover all electrical  
conductors except the bonding or test pads. NOTE: For GaAs microwave microcircuits, the glassivation or nitride  
dielectric shall cover the semiconductor regions (e.g., field effect transistor (FET)) of the device and planar thin film  
resistors as a minimum. Furthermore; for class level S devices, the glassivation or nitride dielectric shall cover  
regions where conductors are separated by less than the minimum 1 mil particle size detectable by a PIND test. For  
RF/microwave GaAs microcircuits, the manufacturer shall define appropriate glassivation thickness requirements for  
the technology in the internal baseline documentation.  
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